• DocumentCode
    3174191
  • Title

    Fin shape influence on the analog performance of standard and strained MuGFETs

  • Author

    Bühler, R.T. ; Martino, J.A. ; Agopian, P.G.D. ; Giacomini, R. ; Simoen, E. ; Claeys, C.

  • Author_Institution
    LSI/PSI, Univ. of Sao Paulo, Sao Paulo, Brazil
  • fYear
    2010
  • fDate
    11-14 Oct. 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    From the analog performance perspective, there is a fin cross-section shape influence on electric parameters. At weak inversion levels the gm/ID is shape dependent, while for moderate and strong inversions the strain type is dominant, where the mobility starts to play an important role. The output conductance and the Early voltage show a strong dependence on both fin shape and strain type. For thinner Wmid there is a performance increase of up to 3 dB on intrinsic voltage gain compared to rectangular shape. Strained devices present better AV and fT, both following the gm tendency for each channel length.
  • Keywords
    field effect transistors; analog performance; channel length; electric parameters; fin cross-section shape influence; fin shape influence; intrinsic voltage gain; output conductance; rectangular shape; standard MuGFET; strain type; strained MuGFET; strained devices; weak inversion levels; Gain; Logic gates; Numerical models; Shape; Silicon; Strain; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference (SOI), 2010 IEEE International
  • Conference_Location
    San Diego, CA
  • ISSN
    1078-621x
  • Print_ISBN
    978-1-4244-9130-8
  • Electronic_ISBN
    1078-621x
  • Type

    conf

  • DOI
    10.1109/SOI.2010.5641387
  • Filename
    5641387