Title :
Numerically controlled sacrificial plasma oxidation using array of electrodes for improving thickness uniformity of SOI
Author :
Sano, Y. ; Kamisaka, S. ; Yoshinaga, K. ; Mimura, H. ; Matsuyama, S. ; Yamauchi, K.
Author_Institution :
Grad. Sch. of Eng., Osaka Univ., Suita, Japan
Abstract :
An array of electrodes covering one-sixth of the area of an 8" wafer was developed as a prototype system for NC sacrificial plasma oxidation. It was demonstrated that the system can be used for simultaneous NC processes by the individual control of the plasma-on time of each electrode.
Keywords :
electrodes; numerical control; oxidation; plasma applications; silicon-on-insulator; NC processes; NC sacrificial plasma oxidation; SOI; array of electrodes; individual control; numerically controlled sacrificial plasma oxidation; prototype system; thickness uniformity; Arrays; Electrodes; Oxidation; Plasmas; Process control; Silicon; Silicon on insulator technology;
Conference_Titel :
SOI Conference (SOI), 2010 IEEE International
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4244-9130-8
Electronic_ISBN :
1078-621x
DOI :
10.1109/SOI.2010.5641395
