Dielectric and structural properties of iron doped titanate nano-composites

TiO₂ has been used for gas sensing devices (Mohammadi et al., 2007) photo catalytic devices (Litter and Navio, 1996) and photoelectric devices (Levy, 1997). Recently the dielectric properties of TiO₂ have been of great interest for applications in the telecommunications industry due to its unusual high dielectric constant and low dielectric loss. The use of layers of high dielectric constant materials in small scale metal insulator semiconductor devices has been considered in numerous recent publications these materials unable to maintain the same capacitance density as SiO₂ films but provide a smaller leakage current density. Examples of such materials include tantalum and yttrium oxides (Moon et al., 1999) and titanium dioxide which has the largest dielectric constant value varying in the range of 25-100 (Tang et al, 1997).