DocumentCode
31762
Title
Generation Dependence of Retention Characteristics in Extremely Scaled NAND Flash Memory
Author
Duckseoung Kang ; Kyunghwan Lee ; Seongjun Seo ; Shinhyung Kim ; Ji-Seok Lee ; Dong-Seok Bae ; Dong Hua Li ; Yuchul Hwang ; Hyungcheol Shin
Author_Institution
Interuniv. Semicond. Res. Center, Seoul Nat. Univ., Seoul, South Korea
Volume
34
Issue
9
fYear
2013
fDate
Sept. 2013
Firstpage
1139
Lastpage
1141
Abstract
We compare three dominant mechanisms in two generations of NAND Flash main chips for mass production. In addition, we analyze the charge loss behaviors of each mechanism according to cycling times. As a result, we confirm that as NAND Flash memory is scaled down, the portion of the interface trap recovery mechanism increases and the sensitivity of cycling times also increases. In the detrapping mechanism, while the charge loss of next generation is more sensitive on cycling times, the amplitude of the charge loss is larger in the current generation. Simultaneously, when the program operation is performed, the number of electrons injected into the floating gate decreases as the physical size of the device decreases. It lowers the portion of the trap-assisted tunneling mechanism and its trend is also accelerated actively as the cycling times increase.
Keywords
NAND circuits; electron traps; flash memories; hole traps; integrated memory circuits; tunnelling; NAND flash main chip; charge loss behavior; current generation; cycling time; extremely scaled NAND flash memory; generation dependence; mass production; retention characteristics; trap assisted tunneling mechanism; Ash; Electron traps; Flash memories; Market research; Next generation networking; Tunneling; Activation energy $({E}_{a})$ ; NAND Flash memory; cycling dependence; detrapping mechanism; failure mechanism; interface trap recovery; trap-assisted tunneling (TAT);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2013.2271351
Filename
6557027
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