DocumentCode
3177695
Title
Wafer topography measurement by fast optical scanning deflectometry
Author
Krey, S. ; Peter, F. ; Dumitrescu, E. ; van Amstel, W.D. ; Klaver, R.G. ; Lous, E.J.
Author_Institution
TRIOPTICS GmbH, Wedel, Germany
fYear
2003
fDate
22-27 June 2003
Firstpage
465
Abstract
Fast optical scanning deflectometry has been introduced for the measurement of the surface figure of optical surfaces. The measurement principle is based on physical ray tracing by means of a narrow laser beam deflected by an oscillating mirror and a large lens arranged for telecentric scanning. A new design of an instrument capable of measuring 12-inch wafers within 60 s and with a slope resolution better 1 μrad is presented.
Keywords
laser mirrors; lenses; measurement by laser beam; optical instruments; optical variables measurement; ray tracing; surface topography measurement; 12 inch; fast optical scanning deflectometry; laser beam deflection; lens; optical surfaces; oscillating mirror; physical ray tracing; surface figure measurement; telecentric scanning; wafer topography measurement; Laser beams; Laser theory; Lenses; Mirrors; Optical sensors; Position measurement; Ray tracing; Semiconductor lasers; Spatial resolution; Surface topography;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN
0-7803-7734-6
Type
conf
DOI
10.1109/CLEOE.2003.1313528
Filename
1313528
Link To Document