DocumentCode
3178186
Title
Thin Film Packaging atmosphere management by solder reflow sealing
Author
Pornin, J.-L. ; Saint-Patrice, D. ; Reig, B. ; Bielen, J. ; Henn, G. ; Giesen, M. ; Fanget, S.
Author_Institution
Commissariat a l´Energie Atomique et Aux Energies Alternatives, Grenoble, France
fYear
2015
fDate
26-29 May 2015
Firstpage
1324
Lastpage
1330
Abstract
Thin Film Packaging (TFP) is a cost effective packaging for MEMS, thanks to the wafer level process, the silicon area saving, and the compatibility with CMOS facilities. One of the most important steps in this process is the sealing of the cap release holes after etching of the sacrificial layer. Standard processes are not well suited for MEMS that require a very controlled and clean atmosphere´s cavity or relatively high pressure like RF switches or accelerometers. Such devices have to operate at a certain pressure to fulfill specifications and are sensitive to contaminants that may compromise long term reliability.
Keywords
CMOS integrated circuits; argon; atmospheric pressure; etching; hermetic seals; micromechanical devices; nitrogen; oxygen; reflow soldering; semiconductor thin films; silicon; wafer level packaging; CMOS compatibility; MEMS; RF switch; TFP; accelerometer; argon; atmospheric pressure; cap release hole; complementary metal oxide semiconductor; hermetical sealing; hermeticity characterization; nitrogen; oxygen free; process flow; sacrificial layer etching; silicon area saving; solder reflow sealing; thin film packaging atmosphere management; wafer level process; wafer level sealing technology; Atmosphere; Cavity resonators; Etching; Fuses; Metals; Micromechanical devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
Conference_Location
San Diego, CA
Type
conf
DOI
10.1109/ECTC.2015.7159769
Filename
7159769
Link To Document