DocumentCode :
3178186
Title :
Thin Film Packaging atmosphere management by solder reflow sealing
Author :
Pornin, J.-L. ; Saint-Patrice, D. ; Reig, B. ; Bielen, J. ; Henn, G. ; Giesen, M. ; Fanget, S.
Author_Institution :
Commissariat a l´Energie Atomique et Aux Energies Alternatives, Grenoble, France
fYear :
2015
fDate :
26-29 May 2015
Firstpage :
1324
Lastpage :
1330
Abstract :
Thin Film Packaging (TFP) is a cost effective packaging for MEMS, thanks to the wafer level process, the silicon area saving, and the compatibility with CMOS facilities. One of the most important steps in this process is the sealing of the cap release holes after etching of the sacrificial layer. Standard processes are not well suited for MEMS that require a very controlled and clean atmosphere´s cavity or relatively high pressure like RF switches or accelerometers. Such devices have to operate at a certain pressure to fulfill specifications and are sensitive to contaminants that may compromise long term reliability.
Keywords :
CMOS integrated circuits; argon; atmospheric pressure; etching; hermetic seals; micromechanical devices; nitrogen; oxygen; reflow soldering; semiconductor thin films; silicon; wafer level packaging; CMOS compatibility; MEMS; RF switch; TFP; accelerometer; argon; atmospheric pressure; cap release hole; complementary metal oxide semiconductor; hermetical sealing; hermeticity characterization; nitrogen; oxygen free; process flow; sacrificial layer etching; silicon area saving; solder reflow sealing; thin film packaging atmosphere management; wafer level process; wafer level sealing technology; Atmosphere; Cavity resonators; Etching; Fuses; Metals; Micromechanical devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
Conference_Location :
San Diego, CA
Type :
conf
DOI :
10.1109/ECTC.2015.7159769
Filename :
7159769
Link To Document :
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