• DocumentCode
    3178186
  • Title

    Thin Film Packaging atmosphere management by solder reflow sealing

  • Author

    Pornin, J.-L. ; Saint-Patrice, D. ; Reig, B. ; Bielen, J. ; Henn, G. ; Giesen, M. ; Fanget, S.

  • Author_Institution
    Commissariat a l´Energie Atomique et Aux Energies Alternatives, Grenoble, France
  • fYear
    2015
  • fDate
    26-29 May 2015
  • Firstpage
    1324
  • Lastpage
    1330
  • Abstract
    Thin Film Packaging (TFP) is a cost effective packaging for MEMS, thanks to the wafer level process, the silicon area saving, and the compatibility with CMOS facilities. One of the most important steps in this process is the sealing of the cap release holes after etching of the sacrificial layer. Standard processes are not well suited for MEMS that require a very controlled and clean atmosphere´s cavity or relatively high pressure like RF switches or accelerometers. Such devices have to operate at a certain pressure to fulfill specifications and are sensitive to contaminants that may compromise long term reliability.
  • Keywords
    CMOS integrated circuits; argon; atmospheric pressure; etching; hermetic seals; micromechanical devices; nitrogen; oxygen; reflow soldering; semiconductor thin films; silicon; wafer level packaging; CMOS compatibility; MEMS; RF switch; TFP; accelerometer; argon; atmospheric pressure; cap release hole; complementary metal oxide semiconductor; hermetical sealing; hermeticity characterization; nitrogen; oxygen free; process flow; sacrificial layer etching; silicon area saving; solder reflow sealing; thin film packaging atmosphere management; wafer level process; wafer level sealing technology; Atmosphere; Cavity resonators; Etching; Fuses; Metals; Micromechanical devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC) , 2015 IEEE 65th
  • Conference_Location
    San Diego, CA
  • Type

    conf

  • DOI
    10.1109/ECTC.2015.7159769
  • Filename
    7159769