Title :
Artificial dielectrics boost imaging systems with diffractive elements
Author :
Lalanne, Philippe ; Lee, M.S.L. ; Rodier, J.C. ; Chavel, P. ; Cambril, E. ; Chen, Y.
Author_Institution :
Lab. Charles Fabry de I´´lnst. d´´Optique, Centre Nat. de la Recherche Sci., Orsay, France
Abstract :
Developments in microlithography and associated technologies now make it possible to produce "artificial media" by engineering the Bloch mode of optical periodic structures. Applications of this concept to imaging diffractive optical elements lead to new components with unprecedented performance.
Keywords :
dielectric materials; diffractive optical elements; nanolithography; periodic structures; scanning electron microscopy; Bloch mode; artificial dielectrics; diffractive optical element imaging; microlithography; optical periodic structures; Dielectrics; Diffraction; Etching; Gratings; High speed optical techniques; Lenses; Optical imaging; Optical materials; Optical refraction; Optical variables control;
Conference_Titel :
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN :
0-7803-7734-6
DOI :
10.1109/CLEOE.2003.1313743
