DocumentCode :
3183290
Title :
Simulation of temperature dependencies using a new and CAD suitable physical GaAs-MESFET model including the electron preheating effect
Author :
Nevermann, P. ; Wolff, I.
Author_Institution :
Inst. fur Mobil- und Satellitenfunktech., Kamp-Lintfort, Germany
fYear :
1995
fDate :
16-20 May 1995
Firstpage :
931
Abstract :
A new physical model for a fast simulation of short channel MESFETs is presented. New analytical approximations for the description of the velocity-overshoot are the basis of a fast physical model named TRISTAN (TRansistor modelling Including bias dependent Saturation velocity, Temperature dependencies and Analysis of Noise). A description of Monte-Carlo results concerning transport and noise properties by means of new analytical formulas also enables an extreme fast access to the material properties. TRISTAN results agree well with experimental data for the noise and small signal equivalent circuit parameters in a wide temperature range down to 27 K. Furthermore it is explained how the electron preheating causes a drastically reduced overshoot effect in some real devices.<>
Keywords :
CAD; III-V semiconductors; Monte Carlo methods; Schottky gate field effect transistors; electronic engineering computing; gallium arsenide; semiconductor device models; semiconductor device noise; thermal analysis; 27 K; CAD suitable model; GaAs; GaAs MESFET model; Monte-Carlo results; TRISTAN; electron preheating effect; noise properties; physical model; short channel MESFETs; simulation; temperature dependencies; transport properties; velocity-overshoot; Analytical models; Circuit noise; Doping; Electron mobility; Gallium arsenide; MESFETs; Material properties; Tellurium; Temperature dependence; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 1995., IEEE MTT-S International
Conference_Location :
Orlando, FL, USA
ISSN :
0149-645X
Print_ISBN :
0-7803-2581-8
Type :
conf
DOI :
10.1109/MWSYM.1995.405896
Filename :
405896
Link To Document :
بازگشت