• DocumentCode
    318660
  • Title

    An on wafer probe for measurements at 140 GHz

  • Author

    Boese, I M ; Collier, R.J. ; Jastrzebski, A.K. ; Ahmed, H. ; Cleaver, J.R. ; Hasko, D.

  • Author_Institution
    Electron. Labs., Kent Univ., Canterbury, UK
  • fYear
    1997
  • fDate
    35530
  • Firstpage
    42614
  • Lastpage
    42620
  • Abstract
    The on wafer probe described here is being designed in collaboration between the Cavendish Laboratory, University of Cambridge and the Electronics Laboratories, University of Kent at Canterbury and is part of a research project on the design of M3ICs at 140 GHz. With the on wafer probe it is possible to contact devices which are situated on a wafer substrate and which are in coplanar waveguide technology (CPW) in order to measure their scattering parameters. The probe is used together with a measurement system using a dielectric waveguide multistate reflectometer which are both mounted on a positioning unit of a probe station
  • Keywords
    probes; 140 GHz; CPW; EHF; MM-wave measurements; coplanar waveguide technology; dielectric waveguide multistate reflectometer; measurement system; onwafer probe; probe station; scattering parameters measurement; wafer substrate;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Terahertz Technology and Its Applications (Digest No: 1997/151), IEE Colloquium on
  • Conference_Location
    London
  • Type

    conf

  • DOI
    10.1049/ic:19970839
  • Filename
    641763