DocumentCode
318660
Title
An on wafer probe for measurements at 140 GHz
Author
Boese, I M ; Collier, R.J. ; Jastrzebski, A.K. ; Ahmed, H. ; Cleaver, J.R. ; Hasko, D.
Author_Institution
Electron. Labs., Kent Univ., Canterbury, UK
fYear
1997
fDate
35530
Firstpage
42614
Lastpage
42620
Abstract
The on wafer probe described here is being designed in collaboration between the Cavendish Laboratory, University of Cambridge and the Electronics Laboratories, University of Kent at Canterbury and is part of a research project on the design of M3ICs at 140 GHz. With the on wafer probe it is possible to contact devices which are situated on a wafer substrate and which are in coplanar waveguide technology (CPW) in order to measure their scattering parameters. The probe is used together with a measurement system using a dielectric waveguide multistate reflectometer which are both mounted on a positioning unit of a probe station
Keywords
probes; 140 GHz; CPW; EHF; MM-wave measurements; coplanar waveguide technology; dielectric waveguide multistate reflectometer; measurement system; onwafer probe; probe station; scattering parameters measurement; wafer substrate;
fLanguage
English
Publisher
iet
Conference_Titel
Terahertz Technology and Its Applications (Digest No: 1997/151), IEE Colloquium on
Conference_Location
London
Type
conf
DOI
10.1049/ic:19970839
Filename
641763
Link To Document