• DocumentCode
    318713
  • Title

    Device and technology challenges for 0.1 μm CMOS

  • Author

    Wong, S. Simon

  • Author_Institution
    Hong Kong Univ. of Sci. & Technol., Kowloon, Hong Kong
  • fYear
    1997
  • fDate
    35672
  • Firstpage
    1
  • Abstract
    Summary form only given. The integrated circuit industry is poised to introduce 0.25 μm products before the end of this year, and is projected to deliver 0.1 μM process in less than 10 years. We will review the challenges ahead and focus on the research opportunities in device and process technology
  • Keywords
    CMOS integrated circuits; integrated circuit technology; technological forecasting; 0.1 micron; CMOS integrated circuits; device technology; process technology; CMOS process; CMOS technology; Electronics industry; Integrated circuit technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1997. Proceedings., 1997 IEEE Hong Kong
  • Print_ISBN
    0-7803-3802-2
  • Type

    conf

  • DOI
    10.1109/HKEDM.1997.641997
  • Filename
    641997
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=318713