Ultrafast electron transport in thin NiFe films on NiO

Author

Acioli, L.H. ; Azevedo, A. ; Bosco, C.A.C.

Author_Institution

Dept. de Fisica, Univ. Fed. de Pernambuco, Recife, Brazil

fYear

2003

fDate

22-27 June 2003

Firstpage

173

Abstract

This work investigates pulse energy effects on the ultrafast dynamics of thin NiFe films on NiO. A detailed study of the electronic relaxation on this important model system for studying ultrafast magnetic behavior dynamics is presented. The NiFe alloy which is studied here is a permalloy for which the static magnetic properties have been well characterized. Pump-probe transient reflectivity measurements at λ = 800 nm, with 100 fs temporal resolution, have been performed on samples with NiFe thicknesses between 10 to 30 nm, also varying the incident pump pulse energies, in order to investigate the influence of the initial distribution on the electronic relaxation.

Keywords

high-speed optical techniques; hot carriers; iron alloys; metallic thin films; nickel alloys; reflectivity; 10 to 30 nm; 100 fs; 800 nm; NiFe; NiFe alloy; NiO; electronic relaxation; permalloy; pulse energy effects; pump-probe transient reflectivity; static magnetic properties; temporal resolution; thin NiFe films; ultrafast electron transport; ultrafast magnetic behavior; Electronic mail; Electrons; Energy measurement; Magnetic films; Magnetic properties; Optical films; Performance evaluation; Pulse measurements; Reflectivity; Thickness measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Quantum Electronics Conference, 2003. EQEC '03. European

Print_ISBN

0-7803-7733-8

Type

conf

DOI

10.1109/EQEC.2003.1314030

Filename

1314030