• DocumentCode
    3187452
  • Title

    Microwave performances of n.p.n. and p.n.p. AlGaAs/GaAs heterojunction bipolar transistors

  • Author

    Bayraktaroglu, B. ; Camilleri, N.

  • Author_Institution
    Texas Instruments Inc., Dallas, TX, USA
  • fYear
    1988
  • fDate
    25-27 May 1988
  • Firstpage
    529
  • Abstract
    The performances of metalorganic vapor-phase-deposition (MOCVD)-grown heterojunction bipolar transistors (HBTs) were compared at microwave frequencies to identify relative merits of each type of device. Figure-of-merit (ft) and maximum frequency of oscillation (f/sub max/) values of devices with 100-nm-thick bases were 22 and 40 GHz for n-p-n transistors, and 19 and 25 GHz for p-n-p transistors, respectively. An accurate device model was developed using the measured S-parameter data. The base resistance of the p-n-p transistors, as determined from the model, was about five times lower than identical-size n-p-n devices. A theoretical comparison of the two types indicates that similar performances may be obtained from both if the base layer thickness of p-n-p transistor is half that of the n-p-n device. Large-signal characterization was carried out at 10 GHz.<>
  • Keywords
    III-V semiconductors; aluminium compounds; bipolar transistors; equivalent circuits; gallium arsenide; semiconductor device models; solid-state microwave devices; vapour phase epitaxial growth; 10 to 40 GHz; 100 nm; AlGaAs-GaAs; EHF; HBTs; III-V semiconductors; MOCVD; S-parameter data; SHF; base layer thickness; base resistance; device model; heterojunction bipolar transistors; large signal characterisation; metalorganic vapor-phase-deposition; microwave frequencies; self aligned fabrication; Delay effects; Frequency; Gallium arsenide; Heterojunction bipolar transistors; Instruments; MOCVD; Microwave devices; Microwave transistors; Optical noise; Pulse amplifiers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium Digest, 1988., IEEE MTT-S International
  • Conference_Location
    New York, NY, USA
  • Type

    conf

  • DOI
    10.1109/MWSYM.1988.22090
  • Filename
    22090