• DocumentCode
    3190342
  • Title

    Scaling and high-frequency performance of AlN/GaN HEMTs

  • Author

    Luo, Xi ; Halder, Subrata ; Curtice, Walter R. ; Hwang, James C M ; Chabak, Kelson D. ; Walker, Dennis E., Jr. ; Dabiran, Amir M.

  • Author_Institution
    Lehigh Univ., Bethlehem, PA, USA
  • fYear
    2011
  • fDate
    Nov. 30 2011-Dec. 2 2011
  • Firstpage
    209
  • Lastpage
    212
  • Abstract
    Small- and large-signal RF characteristics were measured on AlN/GaN HEMTs with 80-160 nm gate length and 100-300 μm gate width. Consistent with the literature, current-gain cut-off frequency and maximum frequency of oscillation were found to increase with inverse gate length independent of gate width. For the first time, output power and efficiency were reported at the high end of X-band, and were comparable to the best reported at 2 GHz, consistent with that estimated from DC characteristics, and insensitive to gate length or width. These results suggest that the performance of AlN/GaN HEMTs is quickly catching up with that of the more mature AlGaN/GaN HEMTs and may be scaled to even higher frequency and higher power.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; microwave transistors; oscillations; scaling circuits; wide band gap semiconductors; AlN-GaN; AlN/GaN HEMT; DC characteristics; X-band; high-frequency performance; inverse gate length; large-signal RF characteristics; oscillation; scaling; small-signal RF characteristics; Aluminum gallium nitride; Gallium nitride; HEMTs; Logic gates; MODFETs; Radio frequency; Cutoff frequency; HEMTs; gallium compounds; microwave transistors; power measurement; pulse measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Radio-Frequency Integration Technology (RFIT), 2011 IEEE International Symposium on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4577-0517-5
  • Type

    conf

  • DOI
    10.1109/RFIT.2011.6141776
  • Filename
    6141776