DocumentCode :
3190342
Title :
Scaling and high-frequency performance of AlN/GaN HEMTs
Author :
Luo, Xi ; Halder, Subrata ; Curtice, Walter R. ; Hwang, James C M ; Chabak, Kelson D. ; Walker, Dennis E., Jr. ; Dabiran, Amir M.
Author_Institution :
Lehigh Univ., Bethlehem, PA, USA
fYear :
2011
fDate :
Nov. 30 2011-Dec. 2 2011
Firstpage :
209
Lastpage :
212
Abstract :
Small- and large-signal RF characteristics were measured on AlN/GaN HEMTs with 80-160 nm gate length and 100-300 μm gate width. Consistent with the literature, current-gain cut-off frequency and maximum frequency of oscillation were found to increase with inverse gate length independent of gate width. For the first time, output power and efficiency were reported at the high end of X-band, and were comparable to the best reported at 2 GHz, consistent with that estimated from DC characteristics, and insensitive to gate length or width. These results suggest that the performance of AlN/GaN HEMTs is quickly catching up with that of the more mature AlGaN/GaN HEMTs and may be scaled to even higher frequency and higher power.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; microwave transistors; oscillations; scaling circuits; wide band gap semiconductors; AlN-GaN; AlN/GaN HEMT; DC characteristics; X-band; high-frequency performance; inverse gate length; large-signal RF characteristics; oscillation; scaling; small-signal RF characteristics; Aluminum gallium nitride; Gallium nitride; HEMTs; Logic gates; MODFETs; Radio frequency; Cutoff frequency; HEMTs; gallium compounds; microwave transistors; power measurement; pulse measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radio-Frequency Integration Technology (RFIT), 2011 IEEE International Symposium on
Conference_Location :
Beijing
Print_ISBN :
978-1-4577-0517-5
Type :
conf
DOI :
10.1109/RFIT.2011.6141776
Filename :
6141776
Link To Document :
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