• DocumentCode
    3190585
  • Title

    Diffusion of In and Ga in selenized Cu-In and Cu-Ga precursors

  • Author

    Marudachalam, M. ; Hichri, H. ; Birkmire, R.W. ; Schultz, J.M. ; Swartzlander, A.B. ; Al-Jassim, M.M.

  • Author_Institution
    Inst. of Energy Conversion, Delaware Univ., Newark, DE, USA
  • fYear
    1996
  • fDate
    13-17 May 1996
  • Firstpage
    805
  • Lastpage
    807
  • Abstract
    The interdiffusion of Ga and In in a CuGaSe2/CuInSe2 thin film diffusion couple and the diffusion of In into CuGaSe2 thin films were studied by Auger depth profiling. CuGaSe2 and CuInSe2 were obtained via selenization by H2Se of sequentially deposited Cu-Ga and Cu-In layers, respectively. The CuGaSe2/CuInSe2 diffusion couple was annealed at 650°C for 30 minutes in an argon atmosphere. The thin film source of In was diffused into CuGaSe2 in the temperature range of 400°C to 600°C for 30 minutes in an argon atmosphere. Bulk interdiffusion coefficients of In and Ga in the CuGaSe2/GuInSe2 couple annealed at 650°C, and the diffusion coefficients of In in CuGaSe2 films diffusion annealed at various temperatures were determined. The interdiffusion coefficients of In and Ga at 650°C in the diffusion couple are similar (DIn=1.5×10-11 cm2 /sec and DGa=4.0×10-11 cm2/sec). The diffusion coefficients of In in CuGaSe2 thin films varied from 2.0×10-13 cm2/sec to 4.5×10-12 cm2/sec in the temperature range of 400°C to 600°C
  • Keywords
    Auger effect; annealing; chemical interdiffusion; copper compounds; gallium compounds; indium compounds; semiconductor thin films; ternary semiconductors; 30 min; 400 to 600 C; 650 C; Auger depth profiling; Cu(InGa)Se2; CuGaSe2; CuGaSe2 thin film diffusion; CuGaSe2/CuInSe2 diffusion couple; CuInSe2; CuInSe2 thin film diffusion; Ga; Ga interdiffusion; H2Se; In; In interdiffusion; annealing; argon atmosphere; diffusion coefficients; interdiffusion coefficients; selenized Cu-Ga precursor; selenized Cu-In precursor; Annealing; Argon; Atmosphere; Computational Intelligence Society; Copper; Energy conversion; Sputtering; Temperature distribution; Transistors; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1996., Conference Record of the Twenty Fifth IEEE
  • Conference_Location
    Washington, DC
  • ISSN
    0160-8371
  • Print_ISBN
    0-7803-3166-4
  • Type

    conf

  • DOI
    10.1109/PVSC.1996.564250
  • Filename
    564250