DocumentCode
3190690
Title
Virtual Double-Gate Operation in Conventional SOI CMOS Technology
Author
Bindu, B. ; Lakshmi, N. ; Bhat, K.N. ; DasGupta, Amitava
Author_Institution
Department of Electrical Engineering, IIT Madras, Chennai - 600 036
fYear
2005
fDate
11-13 Dec. 2005
Firstpage
119
Lastpage
122
Abstract
Double Gate (DG) SOI MOSFETs offer several advantages over the conventional Single Gate (SG) SOI MOSFETs, viz. reduced short-channel effects and subthreshold swing as well as increased current drive and transconductance. However, DG MOSFETs require unconventional technology. In this paper, we show that it is possible to obtain virtual DG operation for both nMOSFETs and pMOSFETs in SOI CMOS technology using conventional SG SOI MOSFETs. The design has been carried out with the help of analytical formulation and subsequently verified using the 2-D Device Simulator MEDICI.
Keywords
Silicon On Insulator; high-performance; low-power; subthreshold slope; transconductance; Analytical models; Back; CMOS integrated circuits; CMOS technology; Isolation technology; MOSFETs; Medical simulation; Silicon on insulator technology; Threshold voltage; Transconductance; Silicon On Insulator; high-performance; low-power; subthreshold slope; transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
INDICON, 2005 Annual IEEE
Print_ISBN
0-7803-9503-4
Type
conf
DOI
10.1109/INDCON.2005.1590137
Filename
1590137
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