• DocumentCode
    3190690
  • Title

    Virtual Double-Gate Operation in Conventional SOI CMOS Technology

  • Author

    Bindu, B. ; Lakshmi, N. ; Bhat, K.N. ; DasGupta, Amitava

  • Author_Institution
    Department of Electrical Engineering, IIT Madras, Chennai - 600 036
  • fYear
    2005
  • fDate
    11-13 Dec. 2005
  • Firstpage
    119
  • Lastpage
    122
  • Abstract
    Double Gate (DG) SOI MOSFETs offer several advantages over the conventional Single Gate (SG) SOI MOSFETs, viz. reduced short-channel effects and subthreshold swing as well as increased current drive and transconductance. However, DG MOSFETs require unconventional technology. In this paper, we show that it is possible to obtain virtual DG operation for both nMOSFETs and pMOSFETs in SOI CMOS technology using conventional SG SOI MOSFETs. The design has been carried out with the help of analytical formulation and subsequently verified using the 2-D Device Simulator MEDICI.
  • Keywords
    Silicon On Insulator; high-performance; low-power; subthreshold slope; transconductance; Analytical models; Back; CMOS integrated circuits; CMOS technology; Isolation technology; MOSFETs; Medical simulation; Silicon on insulator technology; Threshold voltage; Transconductance; Silicon On Insulator; high-performance; low-power; subthreshold slope; transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    INDICON, 2005 Annual IEEE
  • Print_ISBN
    0-7803-9503-4
  • Type

    conf

  • DOI
    10.1109/INDCON.2005.1590137
  • Filename
    1590137