DocumentCode :
3190690
Title :
Virtual Double-Gate Operation in Conventional SOI CMOS Technology
Author :
Bindu, B. ; Lakshmi, N. ; Bhat, K.N. ; DasGupta, Amitava
Author_Institution :
Department of Electrical Engineering, IIT Madras, Chennai - 600 036
fYear :
2005
fDate :
11-13 Dec. 2005
Firstpage :
119
Lastpage :
122
Abstract :
Double Gate (DG) SOI MOSFETs offer several advantages over the conventional Single Gate (SG) SOI MOSFETs, viz. reduced short-channel effects and subthreshold swing as well as increased current drive and transconductance. However, DG MOSFETs require unconventional technology. In this paper, we show that it is possible to obtain virtual DG operation for both nMOSFETs and pMOSFETs in SOI CMOS technology using conventional SG SOI MOSFETs. The design has been carried out with the help of analytical formulation and subsequently verified using the 2-D Device Simulator MEDICI.
Keywords :
Silicon On Insulator; high-performance; low-power; subthreshold slope; transconductance; Analytical models; Back; CMOS integrated circuits; CMOS technology; Isolation technology; MOSFETs; Medical simulation; Silicon on insulator technology; Threshold voltage; Transconductance; Silicon On Insulator; high-performance; low-power; subthreshold slope; transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
INDICON, 2005 Annual IEEE
Print_ISBN :
0-7803-9503-4
Type :
conf
DOI :
10.1109/INDCON.2005.1590137
Filename :
1590137
Link To Document :
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