• DocumentCode
    3191559
  • Title

    Influence of the field emission on the electrical breakdown in vacuum

  • Author

    Shigeta, T. ; Takahashi, E. ; Ebe, A. ; Ogata, K. ; Hayashi, Y. ; Sone, M. ; Mitsui, H.

  • Author_Institution
    Musashi Inst. of Technol., Tokyo, Japan
  • fYear
    1995
  • fDate
    22-25 Oct 1995
  • Firstpage
    179
  • Lastpage
    182
  • Abstract
    The breakdown voltage of vacuum gaps was measured in order to investigate whether a correlation exists between breakdown voltage and characteristics of field emission, using the advantage of being able to change the field emission characteristics by the Ion beam and Vapor Deposition (IVD) method
  • Keywords
    electron field emission; vacuum breakdown; IVD method; electrical breakdown; field emission; vacuum gap; Anodes; Cathodes; Chemical vapor deposition; Copper; Crystallization; Electric breakdown; Electron emission; Heating; Predictive models; Vacuum breakdown;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulation and Dielectric Phenomena, 1995. Annual Report., Conference on
  • Conference_Location
    Virginia Beach, VA
  • Print_ISBN
    0-7803-2931-7
  • Type

    conf

  • DOI
    10.1109/CEIDP.1995.483605
  • Filename
    483605
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3191559