DocumentCode :
3191702
Title :
What does make hopes for X-ray lasers?
Author :
Nickles, P.V. ; Sander, W.
Author_Institution :
Max-Born-Inst., Berlin, Germany
fYear :
2003
fDate :
22-27 June 2003
Firstpage :
434
Abstract :
Progress on the development of new quality X-ray lasers (XRLs) are reported. Alternative ways towards compact XRLs like optical field ionization (OFI) lasers and inner-shell-photoionization systems (ISPS) and state-of-the-art of applications (EUV lithography) of the present day XRLs are reviewed.
Keywords :
X-ray lasers; X-ray lithography; photoionisation; ultraviolet lithography; EUV lithography; X-ray lasers; inner-shell-photoionization systems; optical field ionization lasers; Gas lasers; Laser ablation; Laser excitation; Laser theory; Optical pulses; Physics; Plasma density; Pump lasers; Quantum well lasers; Radiative recombination;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quantum Electronics Conference, 2003. EQEC '03. European
Print_ISBN :
0-7803-7733-8
Type :
conf
DOI :
10.1109/EQEC.2003.1314292
Filename :
1314292
Link To Document :
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