• DocumentCode
    3192518
  • Title

    The Statistical Failure Analysis for the Design of Robust SRAM in Nano-Scale Era

  • Author

    Kim, Young-Gu ; Kim, Soo-Hwan ; Lim, Hoon ; Lee, Sanghoon ; Lee, Keun-Ho ; Park, Young-Kwan ; Yoo, Moon-Hyun

  • Author_Institution
    Samsung Electron. Co. Ltd., Hwasung
  • fYear
    2008
  • fDate
    17-19 March 2008
  • Firstpage
    369
  • Lastpage
    372
  • Abstract
    Increase of the process variability with aggressive technology scaling causes many productivity issues in VLSI manufacturing. Analysis about the relationship between process variability and failure has been performed to specify guidelines in both technology and design aspects for yield optimization. By applying the proposed methodology, the core scheme and the operating voltage of the 200 MHz SRAM were determined to secure the immunity to operational failures. In DFM point of view, the statistical circuit analysis for failure characteristics is indispensable to guarantee an optimal yield in manufacturing.
  • Keywords
    SRAM chips; design for manufacture; failure analysis; integrated circuit yield; nanotechnology; statistical analysis; VLSI manufacture; design for manufacture; frequency 200 MHz; nanoscale era; robust SRAM design; statistical circuit analysis; statistical failure analysis; yield optimization; Design optimization; Failure analysis; Guidelines; Manufacturing processes; Performance analysis; Productivity; Random access memory; Robustness; Very large scale integration; Voltage; DFM; SRAM; Statistical failure analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quality Electronic Design, 2008. ISQED 2008. 9th International Symposium on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-0-7695-3117-5
  • Type

    conf

  • DOI
    10.1109/ISQED.2008.4479759
  • Filename
    4479759