DocumentCode :
3193273
Title :
Performance vs. microstructure in RF sputtered CdS/CdTe solar cells
Author :
Shao, M. ; Jayamaha, U. ; Bykov, E. ; Tabory, C.N. ; Compaan, A.D.
Author_Institution :
Dept. of Phys. & Astron., Toledo Univ., OH, USA
fYear :
1996
fDate :
13-17 May 1996
Firstpage :
869
Lastpage :
872
Abstract :
In RF sputtering the film microstructure can be affected by many factors including substrate temperature, sputter gas pressure, substrate bias, and the magnetic field of the magnetron. In this paper we examine principally the effects of pressure, substrate bias, and the magnetic field of the planar magnetron sputter source on the microstructure and relate this to the performance of CdS/CdTe solar cells in which both semiconductor layers were grown by RF sputtering. With careful choice of gas pressure and magnetic field configuration, we have demonstrated an all-RF-sputtered CdS/CdTe solar cell with AM 1.5 efficiency of 11.6% as confirmed by NREL
Keywords :
II-VI semiconductors; cadmium compounds; crystal microstructure; magnetic fields; semiconductor growth; semiconductor materials; semiconductor thin films; solar cells; sputtered coatings; substrates; 11.6 percent; AM 1.5 efficiency; CdS-CdTe; CdS/CdTe solar cells performance; RF sputtered CdS/CdTe solar cells; film microstructure; magnetic field; magnetron; microstructure; planar magnetron sputter source; sputter gas pressure; substrate bias; substrate temperature; Magnetic fields; Magnetic flux; Magnetic semiconductors; Microstructure; Photovoltaic cells; Plasma measurements; Radio frequency; Sputtering; Substrates; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1996., Conference Record of the Twenty Fifth IEEE
Conference_Location :
Washington, DC
ISSN :
0160-8371
Print_ISBN :
0-7803-3166-4
Type :
conf
DOI :
10.1109/PVSC.1996.564266
Filename :
564266
Link To Document :
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