• DocumentCode
    3195876
  • Title

    Molecular dynamics simulation of the trapping of electrons in sapphire lattice

  • Author

    Rambaut, C. ; Oh, K.H. ; Jaffrezik, H. ; Kohanoff, G. ; Fayeulle, S.

  • Author_Institution
    Dept. Mater. et Mecanique-Phys., Ecole Centrale de Lyon, Ecully, France
  • fYear
    1995
  • fDate
    22-25 Oct 1995
  • Firstpage
    680
  • Lastpage
    683
  • Abstract
    The mechanism of electric charge trapping can be used to describe the storage of energy in dielectric materials. The analysis of the mechanism has been obtained by the space charge physics. Technical simulation such as molecular dynamics applied to this problem allows us to complete the preceding results with a dynamic approach. We show that an excess electron introduced into the sapphire lattice (α-Al2O3) can be trapped only at a limited number of sites. The energy gained by allowing the electron to localize in these sites is of the order of 4-5 eV, in good agreement with the results of the space charge model. Displacements of the neighboring ions due to the implanted charge are shown to be localized in a small region of about 5 Å. Detrapping is observed at 250 K. The ionic displacements turn out to play an important role in modifying the potential landscape by lowering, in a dynamical way, the barriers that cause localization at low temperature
  • Keywords
    electron traps; localised states; molecular dynamics method; sapphire; space charge; α-Al2O3; 250 K; 4 to 5 eV; Al2O3; detrapping; dielectric materials; electron trapping; energy storage; excess electrons; ionic displacements; localized electrons; molecular dynamics simulation; sapphire; Analytical models; Dielectric breakdown; Dielectric materials; Electron traps; Energy storage; Lattices; Material storage; Physics; Plasma temperature; Space charge;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulation and Dielectric Phenomena, 1995. Annual Report., Conference on
  • Conference_Location
    Virginia Beach, VA
  • Print_ISBN
    0-7803-2931-7
  • Type

    conf

  • DOI
    10.1109/CEIDP.1995.483817
  • Filename
    483817