Title :
Formation of Nano-Structures on ITO Antireflection Coating by Hydrogen Plasma Treatments
Author :
Ulyashin, A.G. ; Maknys, K. ; Diplas, S. ; Olsen, A. ; Jorgensen, S. ; Svensson, B.G.
Author_Institution :
Center for Mater. Sci. & Nanotechnol., Oslo Univ.
Abstract :
Recently, low dimensional semiconductor structures such as metallic nanoparticles, have attracted significant attention for photovoltaics. In this work we study the low-temperature formation of metallic nano-dots in an indium tin oxide (ITO) antireflection coating for solar cells after an appropriate hydrogen plasma treatment. Atomic force microscopy (AFM), scanning spreading resistance microscopy (SSRM), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) were used for the analysis of the morphology, electrical properties and composition of ITO layers deposited on Corning glass at different temperatures and subsequently subjected to hydrogen plasma. Formation of highly conductive nano-structures at hydrogenation temperatures below 250degC is observed. It is shown that the nano-structures formation can be controlled by the time and the temperature of the hydrogenation
Keywords :
X-ray photoelectron spectra; antireflection coatings; atomic force microscopy; indium compounds; nanoparticles; nanotechnology; plasma materials processing; scanning electron microscopy; solar cells; AFM; ITO; ITO antireflection coating; InSnO; SEM; SSRM; X-ray photoelectron spectroscopy; XPS; atomic force microscopy; electrical properties; hydrogen plasma treatments; low dimensional semiconductor structures; metallic nanodots; metallic nanoparticles; nanostructured materials; photovoltaics; scanning electron microscopy; scanning spreading resistance microscopy; Atomic force microscopy; Coatings; Hydrogen; Indium tin oxide; Photoelectron microscopy; Photovoltaic cells; Plasma properties; Plasma temperature; Plasma x-ray sources; Scanning electron microscopy;
Conference_Titel :
Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference on
Conference_Location :
Waikoloa, HI
Print_ISBN :
1-4244-0017-1
Electronic_ISBN :
1-4244-0017-1
DOI :
10.1109/WCPEC.2006.279382