DocumentCode
3197583
Title
Thin wafer processing and chip stacking for 3D integration
Author
Matthias, T. ; Kim, B. ; Wimplinger, M. ; Lindner, P.
Author_Institution
EV Group, St. Florian am Inn, Austria
fYear
2010
fDate
13-16 Sept. 2010
Firstpage
1
Lastpage
6
Abstract
The advantages as well as the technical feasibility of through silicon vias (TSV) and 3D integration have been widely acknowledged by the industry. Today the major focus is on the manufacturability and on the integration of all the different building blocks for TSVs and 3D Interconnects. In this paper the advances in the field of thin wafer processing and wafer bonding are presented with emphasis on the integration of all these process steps.
Keywords
three-dimensional integrated circuits; wafer bonding; 3D integration; chip stacking; thin wafer processing; through silicon vias; wafer bonding; Annealing; Bonding; Cleaning; Complexity theory; Semiconductor device reliability; Three dimensional displays;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic System-Integration Technology Conference (ESTC), 2010 3rd
Conference_Location
Berlin
Print_ISBN
978-1-4244-8553-6
Electronic_ISBN
978-1-4244-8554-3
Type
conf
DOI
10.1109/ESTC.2010.5642873
Filename
5642873
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