• DocumentCode
    3197583
  • Title

    Thin wafer processing and chip stacking for 3D integration

  • Author

    Matthias, T. ; Kim, B. ; Wimplinger, M. ; Lindner, P.

  • Author_Institution
    EV Group, St. Florian am Inn, Austria
  • fYear
    2010
  • fDate
    13-16 Sept. 2010
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    The advantages as well as the technical feasibility of through silicon vias (TSV) and 3D integration have been widely acknowledged by the industry. Today the major focus is on the manufacturability and on the integration of all the different building blocks for TSVs and 3D Interconnects. In this paper the advances in the field of thin wafer processing and wafer bonding are presented with emphasis on the integration of all these process steps.
  • Keywords
    three-dimensional integrated circuits; wafer bonding; 3D integration; chip stacking; thin wafer processing; through silicon vias; wafer bonding; Annealing; Bonding; Cleaning; Complexity theory; Semiconductor device reliability; Three dimensional displays;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic System-Integration Technology Conference (ESTC), 2010 3rd
  • Conference_Location
    Berlin
  • Print_ISBN
    978-1-4244-8553-6
  • Electronic_ISBN
    978-1-4244-8554-3
  • Type

    conf

  • DOI
    10.1109/ESTC.2010.5642873
  • Filename
    5642873