DocumentCode :
3198099
Title :
On the microscopic limit of the reaction-diffusion model for the negative bias temperature instability
Author :
Schanovsky, Franz ; Grasser, Tibor
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
fYear :
2011
fDate :
16-20 Oct. 2011
Firstpage :
17
Lastpage :
21
Abstract :
It has recently been proposed that the inability of the reaction-diffusion model for the negative bias temperature instability to properly predict the experimentally observed recovery transients is due to the incomplete description of atomic motion in the one dimensional macroscopic formulation of the theory. In order to investigate this claim, we develop a microscopic formulation of the reaction-diffusion model and simulate it using the kinetic Monte Carlo algorithm. The results of the macroscopic and the atomistic formulation are compared. It shows that the recovery behavior predicted by the RD theory is not affected by the change of the formulation. However, differences arise for the degradation behavior, which, as the microscopic formulation is assumed to be the physically more accurate description, raise questions regarding the physical relevance of the reaction-diffusion theory.
Keywords :
Monte Carlo methods; reaction-diffusion systems; Monte Carlo algorithm; atomic motion; degradation behavior; microscopic limit; negative bias temperature instability; reaction-diffusion model; Boundary conditions; Degradation; Mathematical model; Microscopy; Negative bias temperature instability; Stochastic processes; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report (IRW), 2011 IEEE International
Conference_Location :
South Lake Tahoe, CA
ISSN :
1930-8841
Print_ISBN :
978-1-4577-0113-9
Type :
conf
DOI :
10.1109/IIRW.2011.6142578
Filename :
6142578
Link To Document :
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