• DocumentCode
    3198504
  • Title

    Using carbon nanotube in digital memories

  • Author

    Li, Shu ; Zhang, Tong

  • Author_Institution
    Dept. of Electr., Rensselaer Polytech. Inst., Troy, NY, USA
  • fYear
    2009
  • fDate
    30-31 July 2009
  • Firstpage
    57
  • Lastpage
    60
  • Abstract
    With the continuous technology scaling, interconnect delay plays an increasingly important role in determining integrated circuit performance. This has motivated tremendous research efforts on searching better interconnect technologies as alternatives to conventional Cu wires, among which carbon nanotube (CNT) has received the most attentions. However, in spite of its well demonstrated relatively small delay over long distance, CNT has several drawbacks that prevent it from being used in practice, including fabrication difficulty and contact resistance. This work concerns the practical use of carbon nanotube in digital memories, in particular this paper presents a simple yet effective hybrid word-line/bit-line design solution that aims to complement metal wire with CNT in order to well leverage the low resistance property of CNT and meanwhile embrace the drawbacks inherent in CNT. HSPICE simulations were carried out to demonstrate the effectiveness of this hybrid design strategy at technology nodes down to 16 nm.
  • Keywords
    carbon nanotubes; delay circuits; integrated memory circuits; scaling circuits; HSPICE simulations; carbon nanotube; contact resistance; continuous technology scaling; digital memories; hybrid word-line/bit-line design; integrated circuit performance; interconnect delay; size 16 nm; Application software; Automatic control; Automation; Carbon nanotubes; Computer aided instruction; Computer science; Computer science education; Educational technology; Instruments; Military computing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoscale Architectures, 2009. NANOARCH '09. IEEE/ACM International Symposium on
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    978-1-4244-4957-6
  • Electronic_ISBN
    978-1-4244-4958-3
  • Type

    conf

  • DOI
    10.1109/NANOARCH.2009.5226353
  • Filename
    5226353