DocumentCode
3198629
Title
Joule heating temperature prediction for inductor
Author
Siegert, Laurent ; Fiannaca, Guillaume ; Gautier, Gaël
Author_Institution
ST Microelectron. Tours R&D, Tours, France
fYear
2011
fDate
16-20 Oct. 2011
Firstpage
121
Lastpage
124
Abstract
The aim of this work is to define a joule heating prediction tool under DC stress for thick copper/Low-k inductors on glass substrate technology. The thermal resistance experimental results have been approximated by an empirical model and, combined with thermal coefficient of resistance formalism; allow us to define an analytical temperature joule heating formula. This analytical joule heating formula can be widely used to define the maximum operating conditions and able to be implemented in design rules manuals.
Keywords
approximation theory; inductors; thermal resistance; DC stress; SiO2; analytical joule heating formula; copper-low-k inductors; glass substrate technology; inductor; joule heating prediction tool; joule heating temperature prediction; resistance formalism; temperature joule heating formula; thermal coefficient; thermal resistance; Copper; Electrical resistance measurement; Inductors; Surface resistance; Temperature measurement; Thermal resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report (IRW), 2011 IEEE International
Conference_Location
South Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4577-0113-9
Type
conf
DOI
10.1109/IIRW.2011.6142605
Filename
6142605
Link To Document