Title :
High performance MEMS 0.18μm RF-CMOS transformers
Author :
Katz, Shlomo ; Brouk, Igor ; Stolyarova, Sara ; Shapira, Shye ; Nemirovsky, Yael
Author_Institution :
Dept. of Electr. Eng., Technion - Israel Inst. of Technol., Haifa, Israel
Abstract :
This work presents a micromachined RF-CMOS transformer fabricated in a commercially available 0.18 μm CMOS process. Maskless micromachining post-processing is used to remove oxide and substrate material from around the transformer, reducing parasitic effects and improving the performance of the transformer.
Keywords :
CMOS integrated circuits; micromachining; micromechanical devices; radiofrequency integrated circuits; transformers; High performance MEMS RF-CMOS transformers; maskless micromachining post-processing; micromachined RF-CMOS transformer; parasitic effects; size 0.18 μm; substrate material; CMOS integrated circuits; MEMS; Q enhancement; RF-CMOS transformers; baluns; maskless micromachining; radio frequency integrated circuits;
Conference_Titel :
Microwaves, Communications, Antennas and Electronics Systems, 2009. COMCAS 2009. IEEE International Conference on
Conference_Location :
Tel Aviv
Print_ISBN :
978-1-4244-3985-0
DOI :
10.1109/COMCAS.2009.5386016
