DocumentCode :
319963
Title :
Oxide based compound semiconductor electronics
Author :
Mishra, U.K. ; Parikh, P. ; Chavarkar, P. ; Yen, J. ; Champlain, J. ; Thibeault, B. ; Reese, H. ; Song Stone Shi ; Hu, E. ; Lijie Zhu ; Speck, J.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
fYear :
1997
fDate :
10-10 Dec. 1997
Firstpage :
545
Lastpage :
548
Abstract :
The discovery of an oxide created by the wet thermal oxidation of Al/sub x/Ga/sub 1-x/As compounds has created excitement in the general field of wet thermal oxidation of Al bearing compound semiconductor. We have investigated the use of these oxides for a variety of electronic applications in III-V technology. We have demonstrated oxide based MISFETs and GaAs On Insulator (GOI) technologies for high efficiency electronics as well as novel applications such as current aperturing for RTD´s and vertical transistors.
Keywords :
III-V semiconductors; MOSFET; aluminium compounds; gallium arsenide; oxidation; resonant tunnelling diodes; semiconductor technology; Al/sub x/Ga/sub 1-x/As; AlGaAs; GOI; GaAs; III-V technology; MISFET; RTD; compound semiconductor electronics; current aperturing; oxide; vertical transistor; wet thermal oxidation; Apertures; CMOS technology; Electrons; FETs; Furnaces; Gallium arsenide; Insulation; MOSFETs; Oxidation; Parasitic capacitance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International
Conference_Location :
Washington, DC, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-4100-7
Type :
conf
DOI :
10.1109/IEDM.1997.650443
Filename :
650443
Link To Document :
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