DocumentCode
3199660
Title
TSV modeling and noise coupling in 3D IC
Author
Kim, Joohee ; Cho, Jonghyun ; Kim, Joungho
Author_Institution
Terahertz Interconnection & Package Lab., KAIST, Daejeon, South Korea
fYear
2010
fDate
13-16 Sept. 2010
Firstpage
1
Lastpage
6
Abstract
Through silicon via (TSV) is a promising vertical interconnection method to achieve a 3-dimensional integrated circuit (3D IC) system. However, TSV noise coupling becomes one of the most significant considerations due to the fine pitch integration with TSVs for the smaller form factor. Thus, electrical model of TSV is proposed which is valid up to 20GHz. With the proposed model of TSV, noise coupling model between TSVs is also presented by using 3D TLM method. As for the noise isolation methods between TSVs, p+ and deep n-well guard ring structure are proposed for the substrate noise coupling suppression. In addition, the effect of those proposed shielding techniques is studied in the frequency and time domain.
Keywords
frequency-domain analysis; integrated circuit interconnections; integrated circuit noise; three-dimensional integrated circuits; time-domain analysis; transmission line matrix methods; 3-dimensional integrated circuit; 3D IC; 3D TLM method; TSV electrical modelling; deep n-well guard ring structure; frequency domain; shielding techniques; substrate noise coupling suppression; through silicon via; time domain; vertical interconnection method; Artificial neural networks; Couplings; Insulators; Substrates; Through-silicon vias;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic System-Integration Technology Conference (ESTC), 2010 3rd
Conference_Location
Berlin
Print_ISBN
978-1-4244-8553-6
Electronic_ISBN
978-1-4244-8554-3
Type
conf
DOI
10.1109/ESTC.2010.5642967
Filename
5642967
Link To Document