DocumentCode :
320002
Title :
A high-order terminal iterative learning control scheme [RTP-CVD application]
Author :
Chen, YangQuan ; Xu, Jian-Xin ; Wen, Changyun
Author_Institution :
Dept. of Electr. Eng., Nat. Univ. of Singapore, Singapore
Volume :
4
fYear :
1997
fDate :
10-12 Dec 1997
Firstpage :
3771
Abstract :
A high-order terminal iterative learning control (ILC) scheme is proposed where only the terminal output tracking error instead of the entire output trajectory tracking error is used to update the control profile. A convergence condition is obtained for a class of uncertain discrete-time time-varying linear systems. An application example is presented, by simulation, for a rapid thermal processing chemical vapor deposition (RT-PCVD) thickness control problem in the wafer fab industry
Keywords :
chemical vapour deposition; convergence; discrete time systems; learning systems; process control; rapid thermal processing; semiconductor process modelling; thickness control; time-varying systems; uncertain systems; convergence condition; high-order terminal iterative learning control; rapid thermal processing chemical vapor deposition; terminal output tracking error; thickness control; uncertain discrete-time time-varying linear systems; wafer fab industry; Chemical industry; Chemical vapor deposition; Convergence; Electrical equipment industry; Error correction; Linear systems; Rapid thermal processing; Thickness control; Time varying systems; Trajectory;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Decision and Control, 1997., Proceedings of the 36th IEEE Conference on
Conference_Location :
San Diego, CA
ISSN :
0191-2216
Print_ISBN :
0-7803-4187-2
Type :
conf
DOI :
10.1109/CDC.1997.652444
Filename :
652444
Link To Document :
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