DocumentCode
3200634
Title
RISE: 21.5% Efficient Back Junction Silicon Solar Cell with Laser Technology as a Key Processing Tool
Author
Engelhart, P. ; Harder, N.P. ; Merkle, A. ; Grischke, R. ; Meyer, R. ; Brendel, R.
Author_Institution
Inst. fur Solarenergieforschung Hameln, Emmerthal
Volume
1
fYear
2006
fDate
38838
Firstpage
900
Lastpage
904
Abstract
We employ laser technology as a key processing tool for fabricating our novel RISE (rear interdigitated single evaporation) silicon solar cells. The contactless production sequence incorporates a self-aligning single evaporation step for metallising the interdigitated rear contacts. In this paper, we compare in detail the performance of two types of RISE solar cells with different contact formations to the base: (a) back surface field formation via aluminium doping produced by local laser-firing of the aluminium contact (Al-BSF) and (b) local diffusion of boron (B-BSF). The best solar cell with B-BSF has an AM 1.5 efficiency of 21.5 %. The efficiencies of RISE solar cells with Al-BSF are considerably lower due to 5-10 % lower short-circuit currents. We ascribe these photocurrent losses to a less-efficient BSF effect of the laser-fired contact compared to a boron-diffused BSF
Keywords
diffusion; elemental semiconductors; silicon; solar cells; 21.5 percent; RISE solar cells; Si; aluminium doping; back surface field formation; diffusion; key processing tool; laser technology; laser-firing; rear interdigitated single evaporation; silicon solar cell; Aluminum; Chemical lasers; Costs; Fabrication; Geometrical optics; Metallization; Photovoltaic cells; Production; Silicon; Surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference on
Conference_Location
Waikoloa, HI
Print_ISBN
1-4244-0017-1
Electronic_ISBN
1-4244-0017-1
Type
conf
DOI
10.1109/WCPEC.2006.279601
Filename
4059774
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