• DocumentCode
    3202674
  • Title

    Direct demonstration of sensitization at 980nm optical excitation in erbium-ytterbium silicates

  • Author

    Vanhoutte, Michiel ; Wang, Bing ; Zhou, Zhiping ; Michel, Jürgen ; Kimerling, Lionel C.

  • Author_Institution
    Microphotonics Center, Massachusetts Inst. of Technol., Cambridge, MA, USA
  • fYear
    2010
  • fDate
    1-3 Sept. 2010
  • Firstpage
    308
  • Lastpage
    310
  • Abstract
    Sensitization of erbium by ytterbium in ErxYb2-xSiO5 thin films at 980nm optical excitation is demonstrated by means of comparison of the 1.54μm photoluminescence intensities excited with 488nm and 980nm light. Additionally, it is shown that detrimental Er-Er interactions such as concentration quenching increase non-radiative decay rates at high erbium concentrations. Dilution of erbium by ytterbium reduces these interactions, leading to an increase of internal quantum efficiency.
  • Keywords
    erbium compounds; excitons; photoluminescence; thin films; ytterbium compounds; ErxYb2-xSiO5; concentration quenching; dilution; erbium-ytterbium silicates; internal quantum efficiency; nonradiative decay; optical excitation; photoluminescence; sensitization; thin films; wavelength 1.54 mum; wavelength 488 nm; wavelength 980 nm; Equations; Erbium; Films; Ions; Optical pumping; Photoluminescence; Ytterbium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics (GFP), 2010 7th IEEE International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-6344-2
  • Type

    conf

  • DOI
    10.1109/GROUP4.2010.5643345
  • Filename
    5643345
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3202674