Nonlinearity measurement of thin metal films

Author

Vávra, Robert ; Mach, Pavel

Author_Institution

Dept. of Electrotechnol., Czech Tech. Univ., Prague, Czech Republic

fYear

2001

fDate

2001

Firstpage

202

Lastpage

206

Abstract

Investigation of nonlinearity of thin metal films, which have been manufactured by sputtering under various conditions in Ar, is the goal of this paper. The measurement of nonlinearity by CLTI equipment (Radiometer, Copenhagen) is described in detail and the measurement by the use of a new measuring method, which is based on intermodulation distortion, is presented too. Measured values of nonlinearity of Ni, Al and Al-Si thin films are presented at the end of this paper

Keywords

aluminium; aluminium alloys; intermodulation distortion; metallic thin films; metallisation; nickel; silicon alloys; spatial variables measurement; sputter deposition; Al; Al thin films; Al-Si thin films; AlSi; Ar; Ar sputtering atmosphere; Ni; Ni thin films; intermodulation distortion; measuring method; nonlinearity; nonlinearity measurement; sputtering; thin metal films; Band pass filters; Circuits; Conducting materials; Distortion measurement; Electrical resistance measurement; Impedance measurement; Power harmonic filters; Q measurement; Sputtering; Voltmeters;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronics Technology: Concurrent Engineering in Electronic Packaging, 2001. 24th International Spring Seminar on

Conference_Location

Calimanesti-Caciulata

Print_ISBN

0-7803-7111-9

Type

conf

DOI

10.1109/ISSE.2001.931056

Filename

931056