Growth of Biaxially Textured CeO2 Layers on Glass by Magnetron Sputtering

Recently, a new approach of using a biaxially textured template to grow crystalline silicon on glass for large-area electronics applications was proposed. Here CeO₂ is chosen as a template candidate. RF sputtering of a CeO₂ target in combination with ion beam assisted deposition (IBAD) has been used to create biaxially textured material on a glass substrate. The use of IBAD made it possible to change the texture orientation relative to that of film deposited without the use of IBAD. Another approach has also been studied where RF sputtering is used in combination with inclined substrate deposition (ISD). This approach also did result in the formation of biaxially textured CeO₂. However the texture orientation could not be modified using ISD