DocumentCode
3203335
Title
The weight of the on resistance in Doherty PAs
Author
Colantonio, Paolo ; Giannini, Franco ; Giofrè, Rocco ; Piazzon, Luca
Author_Institution
Dept. of Electr. Eng., Univ. of Roma Tor Vergata, Rome, Italy
fYear
2011
fDate
18-19 April 2011
Firstpage
1
Lastpage
4
Abstract
This contribution highlights how the active device on resistance (RON) can play a significant role in the achievable performances from a Doherty Power Amplifier (DPA). Benefits as well as limitations are stressed comparing two DPAs (DPA1 and DPA2) for X-band applications. Both of them have been realized in the same monolithic technology based on GaAs PHEMT 0.4um power process provided by Selex-SI. Moreover, the DPA1 has been obtained following the classical design approach, i.e. assuming a constant and fixed swing for the main device output voltage. Conversely, the DPA2 has been optimized accounting for the linear behavior of the device knee voltage, due to the effect of RON. From measures an output power at 1dB compression point of about 29dBm, with an associate power gain of 6.5dB, is registered. Finally, DPA1 has shown an efficiency greater than 38% in 6dB of output power back-off, while an efficiency larger than 42% has been achieved with DPA2 in the same output back-off range.
Keywords
III-V semiconductors; MMIC amplifiers; gallium arsenide; high electron mobility transistors; Doherty PA; Doherty power amplifier; GaAs; MMIC; PHEMT; X-band application; device on resistance; device output voltage; gain 6.5 dB; linear behavior; monolithic technology; output power back-off; power process; size 0.4 mum; Gallium arsenide; Knee; MMICs; Modulation; Power amplifiers; Power generation; Resistance; Doherty power amplifier; GaAs; high efficiency; mmic; on resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Nonlinear Microwave and Millimetre-Wave Circuits (INMMIC), 2011 Workshop on
Conference_Location
Vienna
Print_ISBN
978-1-4577-0650-9
Type
conf
DOI
10.1109/INMMIC.2011.5773335
Filename
5773335
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