• DocumentCode
    3203740
  • Title

    Effect of doping-induced defect concentration on the characteristics of Si-quantum-dot solar cells

  • Author

    Shin, Dong Hee ; Hong, Seung Hui ; Kim, Chang Oh ; Choi, Suk-Ho ; Kim, Kyung Joong

  • Author_Institution
    Dept. of Appl. Phys., Kyung Hee Univ., Yongin, South Korea
  • fYear
    2010
  • fDate
    1-3 Sept. 2010
  • Firstpage
    144
  • Lastpage
    146
  • Abstract
    In summary, p-type (or n-type) Si QDs/n-type (or p-type) crystalline-Si solar cells were successfully fabricated by ion beam sputtering and annealing, and their photovoltaic and luminescence properties were studied as functions of doping element and concentration. The active doping of B into the Si quantum dots was successfully proved to be due to the preferred diffusion of B into Si QDs by SIMS depth profiling analysis of B-doped Si02/B-doped Si multilayer film before and after annealing. The B-doped Si-QD solar cells showed close correlation of the photovoltaic properties with the NC/defect PL behaviors. Possible physical mechanisms will be discussed based on the doping-dependent experimental results for various doping elements.
  • Keywords
    annealing; boron; elemental semiconductors; ion beam assisted deposition; photoluminescence; photovoltaic effects; secondary ion mass spectra; semiconductor doping; semiconductor growth; semiconductor quantum dots; silicon; silicon compounds; silicon-on-insulator; solar cells; sputter deposition; superlattices; B active doping; B-doped Si-quantum dot solar cells; B-doped silica/B-doped Si multilayer film; NC/defect PL behaviors; SIMS depth profiling analysis; SiO2-Si:B; annealing; doping concentration; doping element; doping-induced defect concentration; ion beam sputtering; luminescence properties; n-type crystalline-Si solar cells; p-type Si quantum dots; photovoltaic properties; physical mechanisms; preferred diffusion; Annealing; Doping; Films; Photovoltaic cells; Photovoltaic systems; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics (GFP), 2010 7th IEEE International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-6344-2
  • Type

    conf

  • DOI
    10.1109/GROUP4.2010.5643398
  • Filename
    5643398