DocumentCode
3203920
Title
Fabrication variations in SOI microrings for DWDM networks
Author
Peng, Z. ; Fattal, D. ; Fiorentino, M. ; Beausoleil, R.G.
Author_Institution
Inf. & Quantum Syst., HP Labs., Palo Alto, CA, USA
fYear
2010
fDate
1-3 Sept. 2010
Firstpage
120
Lastpage
122
Abstract
We present a statistical analysis of fabrications defects in microring resonators fabricated using 248 nm lithography. We measure the scatter of the resonators´ quality factor, extinction ratio, and resonant wavelength and how they influence DWDM networks.
Keywords
Q-factor; micromechanical resonators; nanolithography; optical resonators; silicon-on-insulator; statistical analysis; wavelength division multiplexing; DWDM networks; SOI microrings; dense wavelength division multiplexing; fabrications defects; lithography; microring resonators fabrication; quality factor; silicon-on-insulator; statistical analysis; wavelength 248 nm; Couplings; Fabrication; Nanophotonics; Silicon; Statistical analysis; Wavelength division multiplexing;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics (GFP), 2010 7th IEEE International Conference on
Conference_Location
Beijing
Print_ISBN
978-1-4244-6344-2
Type
conf
DOI
10.1109/GROUP4.2010.5643406
Filename
5643406
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