Title :
Fabrication variations in SOI microrings for DWDM networks
Author :
Peng, Z. ; Fattal, D. ; Fiorentino, M. ; Beausoleil, R.G.
Author_Institution :
Inf. & Quantum Syst., HP Labs., Palo Alto, CA, USA
Abstract :
We present a statistical analysis of fabrications defects in microring resonators fabricated using 248 nm lithography. We measure the scatter of the resonators´ quality factor, extinction ratio, and resonant wavelength and how they influence DWDM networks.
Keywords :
Q-factor; micromechanical resonators; nanolithography; optical resonators; silicon-on-insulator; statistical analysis; wavelength division multiplexing; DWDM networks; SOI microrings; dense wavelength division multiplexing; fabrications defects; lithography; microring resonators fabrication; quality factor; silicon-on-insulator; statistical analysis; wavelength 248 nm; Couplings; Fabrication; Nanophotonics; Silicon; Statistical analysis; Wavelength division multiplexing;
Conference_Titel :
Group IV Photonics (GFP), 2010 7th IEEE International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-6344-2
DOI :
10.1109/GROUP4.2010.5643406
