DocumentCode :
320404
Title :
Si texturing with sub-wavelength structures [solar cell production]
Author :
Zaidi, Saleem H. ; Brueck, S.R.J.
Author_Institution :
Center for High Technol. Mater., New Mexico Univ., Albuquerque, NM, USA
fYear :
1997
fDate :
29 Sep-3 Oct 1997
Firstpage :
171
Lastpage :
174
Abstract :
Si solar cell surface reflection has been investigated with textured structures smaller than the optical wavelengths. This physical optics approach relies upon absorption through a waveguide mechanism, and has been realized for both uniform and random structures. Laser interferometric lithography techniques have been combined with conventional wet and reactive ion etching of Si to form a wide range of nanoscale 1-D and 2-D structures in both single and polycrystalline Si substrates. Maskless reactive ion etching of Si has also been employed to form highly absorptive nanoscale structures. For identically etched structures, uniform structures showed an order of magnitude smaller reflectance than random structures
Keywords :
elemental semiconductors; light interferometry; light reflection; lithography; semiconductor device testing; silicon; solar cells; sputter etching; surface texture; Si; Si solar cells; laser interferometric lithography; nanoscale structures; optical wavelength; reactive ion etching; reflectance; solar cell texturing; sub-wavelength structures; surface reflection; wet etching; Etching; Optical reflection; Optical surface waves; Optical waveguides; Particle beam optics; Photovoltaic cells; Physical optics; Production; Surface texture; Surface waves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1997., Conference Record of the Twenty-Sixth IEEE
Conference_Location :
Anaheim, CA
ISSN :
0160-8371
Print_ISBN :
0-7803-3767-0
Type :
conf
DOI :
10.1109/PVSC.1997.654056
Filename :
654056
Link To Document :
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