• DocumentCode
    3204354
  • Title

    Research on the Static Characteristics of CMOS Circuits in the Effects of Gate Tunneling Current

  • Author

    Tiefeng, Wu ; HeMing, Zhang ; HuiYong, Hu

  • Author_Institution
    Key Lab. of Wide Band-Gap Semicond. Mater. & Devices, Xidian Univ., Xian, China
  • Volume
    3
  • fYear
    2010
  • fDate
    11-12 May 2010
  • Firstpage
    173
  • Lastpage
    177
  • Abstract
    With the scaling of transistor dimensions, thinner gate oxides results in exponential increases in gate tunneling current and static standby power consumption of CMOS circuits is severely affected by the presence of gate tunneling currents. In this paper, a theory gate tunneling current model in ultra-thin gate oxide MOS devices that tunneling current changes with gate-oxide thickness is presented and the simulation results in BSIM4 model well agree with the model proposed. The characteristics of current source inverter composed are also studied in detail to analyze its behavior and predict the trends of power dissipated with scaled technology nodes in the effects of gate tunneling current.
  • Keywords
    CMOS integrated circuits; MIS devices; invertors; BSIM4 model; CMOS circuits; current source inverter; gate oxides; gate tunneling current; scaled technology nodes; static standby power consumption; transistor dimension scaling; ultrathin gate oxide MOS devices; CMOS technology; Circuit simulation; Degradation; Energy consumption; Inverters; MOS devices; MOSFET circuits; Semiconductor device modeling; Tunneling; Voltage; Device Simulation; Gate Tunneling Current Model; Static Power Consumption; Ultra-Thin Gate Oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Intelligent Computation Technology and Automation (ICICTA), 2010 International Conference on
  • Conference_Location
    Changsha
  • Print_ISBN
    978-1-4244-7279-6
  • Electronic_ISBN
    978-1-4244-7280-2
  • Type

    conf

  • DOI
    10.1109/ICICTA.2010.154
  • Filename
    5523298