DocumentCode
3204354
Title
Research on the Static Characteristics of CMOS Circuits in the Effects of Gate Tunneling Current
Author
Tiefeng, Wu ; HeMing, Zhang ; HuiYong, Hu
Author_Institution
Key Lab. of Wide Band-Gap Semicond. Mater. & Devices, Xidian Univ., Xian, China
Volume
3
fYear
2010
fDate
11-12 May 2010
Firstpage
173
Lastpage
177
Abstract
With the scaling of transistor dimensions, thinner gate oxides results in exponential increases in gate tunneling current and static standby power consumption of CMOS circuits is severely affected by the presence of gate tunneling currents. In this paper, a theory gate tunneling current model in ultra-thin gate oxide MOS devices that tunneling current changes with gate-oxide thickness is presented and the simulation results in BSIM4 model well agree with the model proposed. The characteristics of current source inverter composed are also studied in detail to analyze its behavior and predict the trends of power dissipated with scaled technology nodes in the effects of gate tunneling current.
Keywords
CMOS integrated circuits; MIS devices; invertors; BSIM4 model; CMOS circuits; current source inverter; gate oxides; gate tunneling current; scaled technology nodes; static standby power consumption; transistor dimension scaling; ultrathin gate oxide MOS devices; CMOS technology; Circuit simulation; Degradation; Energy consumption; Inverters; MOS devices; MOSFET circuits; Semiconductor device modeling; Tunneling; Voltage; Device Simulation; Gate Tunneling Current Model; Static Power Consumption; Ultra-Thin Gate Oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Intelligent Computation Technology and Automation (ICICTA), 2010 International Conference on
Conference_Location
Changsha
Print_ISBN
978-1-4244-7279-6
Electronic_ISBN
978-1-4244-7280-2
Type
conf
DOI
10.1109/ICICTA.2010.154
Filename
5523298
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