Title :
Research on the Static Characteristics of CMOS Circuits in the Effects of Gate Tunneling Current
Author :
Tiefeng, Wu ; HeMing, Zhang ; HuiYong, Hu
Author_Institution :
Key Lab. of Wide Band-Gap Semicond. Mater. & Devices, Xidian Univ., Xian, China
Abstract :
With the scaling of transistor dimensions, thinner gate oxides results in exponential increases in gate tunneling current and static standby power consumption of CMOS circuits is severely affected by the presence of gate tunneling currents. In this paper, a theory gate tunneling current model in ultra-thin gate oxide MOS devices that tunneling current changes with gate-oxide thickness is presented and the simulation results in BSIM4 model well agree with the model proposed. The characteristics of current source inverter composed are also studied in detail to analyze its behavior and predict the trends of power dissipated with scaled technology nodes in the effects of gate tunneling current.
Keywords :
CMOS integrated circuits; MIS devices; invertors; BSIM4 model; CMOS circuits; current source inverter; gate oxides; gate tunneling current; scaled technology nodes; static standby power consumption; transistor dimension scaling; ultrathin gate oxide MOS devices; CMOS technology; Circuit simulation; Degradation; Energy consumption; Inverters; MOS devices; MOSFET circuits; Semiconductor device modeling; Tunneling; Voltage; Device Simulation; Gate Tunneling Current Model; Static Power Consumption; Ultra-Thin Gate Oxide;
Conference_Titel :
Intelligent Computation Technology and Automation (ICICTA), 2010 International Conference on
Conference_Location :
Changsha
Print_ISBN :
978-1-4244-7279-6
Electronic_ISBN :
978-1-4244-7280-2
DOI :
10.1109/ICICTA.2010.154