Title :
The Spatial Distribution of Neutral Radicals in SiH4 RF Glow Discharges Measured by a Mass Spectrometer with a Movable Gas Sampling System
Author :
Lin, Kuixun ; Lin, Xuanying ; Wang, Zhaokui ; Qiu, Guiming ; Zhu, Zusong
Author_Institution :
Dept. of Phys., Shantou Univ.
Abstract :
A movable mass spectroscopy gas sampling apparatus has been proposed, established and equipped in a residual gas analyzer (SRS RGA-100). This mass spectroscopy analysis system has been used to measure the spatial density distributions of SiHn (n=0-3) radicals in silane radio frequency glow discharge successfully. The experimental results demonstrate that the densities of various neutral radicals SiHn (n=0-3) in silane plasma have each peak value near the middle position of electrodes, and the densities of SiH2 and SiH3 are higher than those of Si and SiH. This reveals that SiH2 and SiH3 may be the primary precursors in forming the a-Si:H film
Keywords :
electrodes; elemental semiconductors; glow discharges; high-frequency discharges; hydrogen; plasma density; plasma materials processing; plasma-wall interactions; semiconductor thin films; silicon; SRS RGA-100; Si:H; mass spectrometer; movable mass spectroscopy gas sampling; neutral radicals; radio frequency glow discharges; residual gas analyzer; silane plasma; spatial density distributions; Density measurement; Electrodes; Glass; Glow discharges; Mass spectroscopy; Plasma density; Plasma measurements; Radio frequency; Sampling methods; Semiconductor films;
Conference_Titel :
Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference on
Conference_Location :
Waikoloa, HI
Print_ISBN :
1-4244-0017-1
Electronic_ISBN :
1-4244-0017-1
DOI :
10.1109/WCPEC.2006.279817
