DocumentCode :
3205230
Title :
Production Equipment for Large Area Deposition of Amorphous and Microcrystalline Silicon Thin-Film Solar Cells
Author :
Repmann, T. ; Wieder, S. ; Klein, S. ; Stiebig, H. ; Rech, B.
Author_Institution :
Appl. Films GmbH & Co., Alzenau
Volume :
2
fYear :
2006
fDate :
38838
Firstpage :
1724
Lastpage :
1727
Abstract :
This work addresses Applied Films (AF) work on the development of production equipment for silicon thin-film solar cells based on a tandem structure of amorphous silicon top and microcrystalline silicon bottom cells (a-Si:H/muc-Si:H) on glass substrates. Preceding work at the Institute of Photovoltaics (IPV) has demonstrated efficiencies >10% for a-Si:H/muc-Si:H modules on 30times30 cm2 substrate size. Recently, AF in close cooperation with the IPV succeeded to transfer the PECVD processes to a large area lab coater at AF and yielded initial efficiencies >10% for a-Si:H/muc-Si:H modules. Based on these results AF worked out a concept for mass production equipment for amorphous and microcrystalline silicon solar cells
Keywords :
amorphous semiconductors; elemental semiconductors; plasma CVD; plasma materials processing; production equipment; semiconductor device manufacture; semiconductor thin films; silicon; solar cells; thin film devices; PECVD process; Si:H; amorphous silicon thin-film solar cells; applied films; glass substrates; microcrystalline silicon thin-film solar cells; production equipment; tandem structure; Amorphous materials; Amorphous silicon; Glass; Mass production; Photovoltaic cells; Production equipment; Semiconductor films; Semiconductor thin films; Sputtering; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference on
Conference_Location :
Waikoloa, HI
Print_ISBN :
1-4244-0017-1
Electronic_ISBN :
1-4244-0017-1
Type :
conf
DOI :
10.1109/WCPEC.2006.279824
Filename :
4059990
Link To Document :
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