DocumentCode
3208796
Title
Relative Contribution of Volume and Surface-Plasma Generation of Negative Ions in Gas Discharges
Author
Dudnikov, Vadim
Author_Institution
Brookhaven Technology Group Inc. Setauket, NY, 11733 U.S.A.
fYear
2005
fDate
16-20 May 2005
Firstpage
2482
Lastpage
2484
Abstract
Surface-plasma generation of extracted H-ions in gas discharges without the addition of cesium is analyzed. At the present time, it is common consensus that surface-plasma generation of extracted H-ions dominates above volume processes in discharges with the admixture of cesium or other catalysts with low ionization potential. We will present evidence that surface-plasma generation can be enhanced in high density discharges without cesium after electrode activation by high temperature conditioning in the discharge. The diffusion of impurities with low ionization potential is the presumed cause of the observed H-emission enhancement. For the effective generation of H-ion beams in discharges without cesium, it is necessary to optimize surface-plasma generation of extracted H-ions. Such optimization allows considerable improvement of H-/D-sources characteristics.
Keywords
Anodes; Current density; Electrodes; Electron emission; Fault location; Ion sources; Plasma density; Plasma sources; Plasma temperature; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 2005. PAC 2005. Proceedings of the
Print_ISBN
0-7803-8859-3
Type
conf
DOI
10.1109/PAC.2005.1591152
Filename
1591152
Link To Document