Development of Copper Coated Chamber for Third Generation Light Sources

We describe the development of the copper coated chamber, which is suitable for the 3rd generation light sources. This chamber aims to reduce the resistive-wall impedance^[1]. However, this coating might affect the ultra-high vacuum condition worse. In order to check the validity of this chamber for the ultra-high vacuum condition, we have produced the copper coated chamber and built the test bench. The measured outgassing from the inner surface of the newly developed copper coated chamber is sufficiently small to utilize in ultra-high vacuum condition.