Title :
Improving the electron emission properties of ion-beam-synthesized Ag-Si02 nanocomposites by pulsed laser annealing
Author :
Tsang, W.M. ; Adikaari, A. A D T ; Stolojan, V. ; Sealy, B. ; Wong, S.P. ; Silva, S.R.P.
Author_Institution :
Massachusetts Inst. of Technol., Cambridge
Abstract :
In this work, pulsed laser annealing (PLA) was preformed on ion-beam-synthesized Ag-SiO2 nanocomposites to improve the FE properties of these samples by modifying the size and distribution of the Ag nanoclusters. The PLA was preformed using a 248 nm KrF excimer laser. Multiple pulses, with durations of 25 ns, at an energy density of 250 mJ/cm were accumulated onto the sample. The FE properties of the samples were studied in a high vacuum chamber, with a base pressure better than 5x10-4 Pa. The current-electric field (I-F) characteristics were measured using a "sphere-to-plane" electrode configuration, with a 5 mm diameter stainless-steel ball anode. The applied electric field was obtained by dividing the applied voltage by the gap distance and the threshold field (Fth) and is defined as the field strength when an emission current of 1 nA is achieved. The microstructure and the surface morphology of these samples are determined by the cross-section transmission electron microscopy (XTEM) and atomic force microscopy (AFM) measurements, respectively.
Keywords :
atomic force microscopy; electron field emission; excimer lasers; ion beam applications; krypton compounds; laser beam annealing; nanocomposites; particle size; silver compounds; surface morphology; transmission electron microscopy; AFM; Ag-SiO2; KrF; XTEM; atomic force microscopy; cross-section transmission electron microscopy; current 1 nA; current-electric field characteristics measurement; electron field emission properties; emission current; excimer laser; high vacuum chamber; ion-beam-synthesized nanocomposites; microstructure; nanocluster size; pulsed laser annealing; size 5 mm; sphere-to-plane electrode configuration; stainless-steel ball anode; surface morphology; threshold field; time 25 ns; wavelength 248 nm; Annealing; Atomic force microscopy; Atomic measurements; Electron emission; Force measurement; Iron; Nanocomposites; Optical pulses; Programmable logic arrays; Transmission electron microscopy;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2007. IVNC. IEEE 20th International
Conference_Location :
Chicago, IL
Print_ISBN :
978-1-4244-1133-7
Electronic_ISBN :
978-1-4244-1134-4
DOI :
10.1109/IVNC.2007.4480951