DocumentCode :
3210643
Title :
Fabrication and field emission properties of gated field emitter arrays with hafnium nitride cathode
Author :
Gotoh, Y. ; Setojima, N. ; Miyata, Y. ; Kanzawa, T. ; Tsuji, H. ; Ishikawa, J.
Author_Institution :
Kyoto Univ., Kyoto
fYear :
2007
fDate :
8-12 July 2007
Firstpage :
141
Lastpage :
142
Abstract :
We fabricated the FEAs of which emitters are covered with HfN films, and showed relatively good electron emission properties including lifetime and operation at the elevated temperatures up to 100degC. The fabricated device showed relatively good electron emission properties. Typically, electron emission started at VEG of about 40 V, and the current of 1 muA was observed at VEG of 60 V. Some of the 2,025-tip FEA yielded a high current of 100 muA at VEG of 120 V.
Keywords :
cathodes; field emitter arrays; hafnium compounds; nanoelectronics; HfN; current 1 muA; current 100 muA; electron emission; field emission test; gated field emitter arrays; hafnium nitride cathode; vacuum chamber; vacuum nanoelectronics devices; voltage 120 V; voltage 40 V; voltage 60 V; Cathodes; Fabrication; Field emitter arrays; Hafnium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2007. IVNC. IEEE 20th International
Conference_Location :
Chicago, IL
Print_ISBN :
978-1-4244-1133-7
Electronic_ISBN :
978-1-4244-1134-4
Type :
conf
DOI :
10.1109/IVNC.2007.4480969
Filename :
4480969
Link To Document :
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