Title :
Growth control of carbon nanotubes by RE plasma enhanced chemical vapor deposition
Author :
Suzuki, Atsushi ; Sato, Hideki ; Sakai, Takamichi ; Takegawa, Hitoshi ; Hata, Koichi ; Kajiwara, Kazuo ; Saito, Yahachi
Abstract :
In this study, the CNT growth by the RF-PECVD is sensitive to the granulation condition of catalyst film. It is expected that further precise control of the granulation of catalyst film enables further improvement of controllability of CNT growth that gives better FE characteristics.
Keywords :
carbon nanotubes; catalysts; field emission; plasma CVD; C; FE characteristics; RF plasma enhanced chemical vapor deposition; RF-PECVD; carbon nanotubes growth control; catalyst film granulation; field emission properties; Carbon nanotubes; Chemical vapor deposition; Hydrogen; Inductors; Iron; Plasma chemistry; Radio frequency; Scanning electron microscopy; Substrates; Surface morphology;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2007. IVNC. IEEE 20th International
Conference_Location :
Chicago, IL
Print_ISBN :
978-1-4244-1133-7
Electronic_ISBN :
978-1-4244-1134-4
DOI :
10.1109/IVNC.2007.4480991
