Operation of the Digital Electrostatic e-beam Array Lithography (DEAL) prototype with dose control

Author

Baylor, L.R. ; Gardner, W.L. ; Randolph, S.J. ; Guan, Y.F. ; Rack, P.D. ; Moore, J.A. ; Ericson, M.N.

Author_Institution

Oak Ridge Nat. Lab., Oak Ridge

fYear

2007

fDate

8-12 July 2007

Firstpage

197

Lastpage

199

Abstract

The digital electrostatically focused e-beam array direct-write lithography (DEAL) concept is currently under development at Oak Ridge National Laboratory (ORNL) . This concept incorporates a digitally addressable field-emission array (DAFEA) employing electrostatic focusing with an integrated dose control circuit to function as the write head for an e-beam lithography tool. Electron beams from each emitter cathode are individually addressable, thus enabling parallel patterning of a target substrate by multiple electron sources.

Keywords

cathodes; electron beam focusing; electron beam lithography; field emitter arrays; DEAL; Oak Ridge National Laboratory; digital electrostatic e-beam array lithography; digitally addressable field-emission array; electron beam lithography; electrostatic focusing; emitter cathode; focused e-beam array direct-write lithography; integrated dose control circuit; multiple electron sources; parallel patterning; Carbon dioxide; Cathodes; Circuits; Electrostatics; Laboratories; Lithography; Nanoscale devices; Prototypes; Tungsten; Voltage control;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Nanoelectronics Conference, 2007. IVNC. IEEE 20th International

Conference_Location

Chicago, IL

Print_ISBN

978-1-4244-1133-7

Electronic_ISBN

978-1-4244-1134-4

Type

conf

DOI

10.1109/IVNC.2007.4480993

Filename

4480993