Title :
A comprehensive framework for predictive modeling of negative bias temperature instability
Author :
Chakravarthi, S. ; Krishnan, A.T. ; Reddy, V. ; Machala, C.F. ; Krishnan, Sridhar
Author_Institution :
Silicon Technol. Dev., Texas Instruments Inc., Dallas, TX, USA
Abstract :
A quantitative model is developed for the first time, that comprehends all the unique characteristics of NBTI degradation. Several models are critically examined to develop a reaction/diffusion based modeling framework for predicting interface state generation during NBTI stress. NBTI degradation is found to be dominated by diffusion of neutral atomic and molecular hydrogen related defects. Additionally, the presence of hydrogen gettering sites such as unsaturated grain bound- aries significantly enhance NBTI degradation, whereas hydrogen sources reduce NBTI degradation. The model also suggests the possible mechanisms for saturation. The model is calibrated over a range of stress temperatures and voltages. The model captures recovery, experimental delay and frequency effects successfully.
Keywords :
CMOS integrated circuits; electric breakdown; getters; grain boundaries; integrated circuit modelling; integrated circuit reliability; semiconductor device models; semiconductor device reliability; H gettering sites; comprehensive framework; diffusion; interface state generation; negative bias temperature instability; predictive modeling; reaction/diffusion based modeling framework; stress temperatures; unsaturated grain boundaries; voltages; Degradation; Gettering; Hydrogen; Interface states; Negative bias temperature instability; Niobium compounds; Predictive models; Stress; Temperature distribution; Titanium compounds;
Conference_Titel :
Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International
Print_ISBN :
0-7803-8315-X
DOI :
10.1109/RELPHY.2004.1315337