DocumentCode
3211861
Title
RF S-parameter degradation under hot carrier stress
Author
Walko, Joseph P. ; Abadeer, Bill
Author_Institution
IBM Microeletronics, Essex Junction, VT, USA
fYear
2004
fDate
25-29 April 2004
Firstpage
422
Lastpage
425
Abstract
The increasing high frequency capabilities of CMOS have resulted in increased RF and analog design in CMOS. Design of RF and analog circuits depends critically on device S-parameter characteristics, magnitude of real and imaginary components and their behavior as a function of frequency. Utilization of scaled high performance CMOS technologies poses challenges as concerns for reliability degradation mechanisms increase. It is important to understand and quantify the effects of the reliability degradation mechanisms on the S-parameters and in turn on RF and analog applications. Current modeling of voltage stress effects normally is limited to low frequency parameters, as is in-line characterization. In this paper we discuss the relationship between the low frequency parameters commonly characterized & modeled with the shifts in RF properties of MOSFETs.
Keywords
CMOS integrated circuits; MOSFET; hot carriers; integrated circuit design; integrated circuit reliability; integrated circuit testing; CMOS; MOSFETs; RF S-parameter degradation; RF circuits; RF design; analog circuits; analog design; frequency; high frequency capabilities; hot carrier stress; scaled high performance CMOS technologies; Analog circuits; CMOS technology; Degradation; Hot carriers; MOSFETs; Radio frequency; Scattering parameters; Semiconductor device modeling; Stress; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International
Print_ISBN
0-7803-8315-X
Type
conf
DOI
10.1109/RELPHY.2004.1315364
Filename
1315364
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