• DocumentCode
    3211861
  • Title

    RF S-parameter degradation under hot carrier stress

  • Author

    Walko, Joseph P. ; Abadeer, Bill

  • Author_Institution
    IBM Microeletronics, Essex Junction, VT, USA
  • fYear
    2004
  • fDate
    25-29 April 2004
  • Firstpage
    422
  • Lastpage
    425
  • Abstract
    The increasing high frequency capabilities of CMOS have resulted in increased RF and analog design in CMOS. Design of RF and analog circuits depends critically on device S-parameter characteristics, magnitude of real and imaginary components and their behavior as a function of frequency. Utilization of scaled high performance CMOS technologies poses challenges as concerns for reliability degradation mechanisms increase. It is important to understand and quantify the effects of the reliability degradation mechanisms on the S-parameters and in turn on RF and analog applications. Current modeling of voltage stress effects normally is limited to low frequency parameters, as is in-line characterization. In this paper we discuss the relationship between the low frequency parameters commonly characterized & modeled with the shifts in RF properties of MOSFETs.
  • Keywords
    CMOS integrated circuits; MOSFET; hot carriers; integrated circuit design; integrated circuit reliability; integrated circuit testing; CMOS; MOSFETs; RF S-parameter degradation; RF circuits; RF design; analog circuits; analog design; frequency; high frequency capabilities; hot carrier stress; scaled high performance CMOS technologies; Analog circuits; CMOS technology; Degradation; Hot carriers; MOSFETs; Radio frequency; Scattering parameters; Semiconductor device modeling; Stress; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International
  • Print_ISBN
    0-7803-8315-X
  • Type

    conf

  • DOI
    10.1109/RELPHY.2004.1315364
  • Filename
    1315364