DocumentCode :
3211861
Title :
RF S-parameter degradation under hot carrier stress
Author :
Walko, Joseph P. ; Abadeer, Bill
Author_Institution :
IBM Microeletronics, Essex Junction, VT, USA
fYear :
2004
fDate :
25-29 April 2004
Firstpage :
422
Lastpage :
425
Abstract :
The increasing high frequency capabilities of CMOS have resulted in increased RF and analog design in CMOS. Design of RF and analog circuits depends critically on device S-parameter characteristics, magnitude of real and imaginary components and their behavior as a function of frequency. Utilization of scaled high performance CMOS technologies poses challenges as concerns for reliability degradation mechanisms increase. It is important to understand and quantify the effects of the reliability degradation mechanisms on the S-parameters and in turn on RF and analog applications. Current modeling of voltage stress effects normally is limited to low frequency parameters, as is in-line characterization. In this paper we discuss the relationship between the low frequency parameters commonly characterized & modeled with the shifts in RF properties of MOSFETs.
Keywords :
CMOS integrated circuits; MOSFET; hot carriers; integrated circuit design; integrated circuit reliability; integrated circuit testing; CMOS; MOSFETs; RF S-parameter degradation; RF circuits; RF design; analog circuits; analog design; frequency; high frequency capabilities; hot carrier stress; scaled high performance CMOS technologies; Analog circuits; CMOS technology; Degradation; Hot carriers; MOSFETs; Radio frequency; Scattering parameters; Semiconductor device modeling; Stress; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International
Print_ISBN :
0-7803-8315-X
Type :
conf
DOI :
10.1109/RELPHY.2004.1315364
Filename :
1315364
Link To Document :
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