Title :
Tthe study of black matrix ashing of FPD industry by atmospheric pressure plasma technology
Author :
Hsieh, Wen-Tzong ; Tsai, Chen-Der ; Lin, Je-Uai ; Su, Chun-Hsien ; Liu, Chi-Hung
Author_Institution :
Mech. & Syst. Res. Labs., Ind. Technol. Res. Inst., Hsinchu, Taiwan
Abstract :
Summary form only given. The black matrix (BM) rework using traditional wet process in the LCD industries is time consuming, costly and pollution. However, the plasma process provides a fast, less expensive and clean alternative. Especially, it is noticed that atmospheric pressure plasma attracts many attentions due to their lower equipment cost, operating without chambers and most suitable for large area substrate processing. The purpose of this paper is to discuss the BM ashing characteristics by a homemade atmospheric-pressure plasma jet (APPJ). The nitrogen, oxygen and compressed dried air (CDA) were excited by a tunable-frequency AC power. To study the APPJ performance on BM ashing and reduce the number of experiments while retains the quality of data collection, the response surface methodology (RSM), one kind of designed experiment methodologies were used. The oxygen ratio (feeds into plasma as a radical source), substrate temperature and plasma power were the major factors of discussion for BM ashing characteristics. The surface profiler and scanning probe microscope were used to define ashing rate. Besides, the optical emission spectrometry was used to detect the reaction species of the plasma. It was found that the ashing rate was increasing while the O2/N2 ratio and the substrate temperature increasing. Finally, the relationship between the processing factors and the reactive species concentrations of APPJ of BM ashing was also studied.
Keywords :
electronics industry; flat panel displays; liquid crystal displays; nitrogen; oxygen; plasma chemistry; plasma diagnostics; plasma jets; plasma materials processing; response surface methodology; scanning probe microscopy; sputter etching; APPJ; FPD industry; LCD industries; O2-N2; ashing rate; atmospheric pressure plasma jet; black matrix ashing; compressed dried air; flat panel industry; optical emission spectrometry; oxygen ratio; reaction species; response surface methodology; scanning probe microscope; surface profiler; tunable-frequency AC power; Atmospheric-pressure plasmas; Costs; Environmentally friendly manufacturing techniques; Industrial pollution; Plasma applications; Plasma materials processing; Plasma properties; Plasma sources; Plasma temperature; Response surface methodology;
Conference_Titel :
Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4244-2617-1
DOI :
10.1109/PLASMA.2009.5227348