DocumentCode :
3212301
Title :
Role of ions in a crossed-field diode II: Monte Carlo collisions
Author :
Stutzman, B.S. ; Luginsland, J.W.
Author_Institution :
Dept. of Sci. New London, US Coast Guard Acad., New London, CT, USA
fYear :
2009
fDate :
1-5 June 2009
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given: The effect of ions in a magnetically insulated crossed-field gap is studied using a particle-in-cell simulation with Monte Carlo collisions (MCC). (Code available through the PTSG at UC Berkeley.) These results are compared with the predictions from single particle orbit, shear flow models and previous particle-in-cell simulations in which the ions were modeled as a sheet of charge fixed at different positions within the gap. The results of this experiment indicate that the diode loses insulation much more rapidly than shown in the immobile ion sheet model. The reasons for this increased rate of electron migration toward the anode are that the ions in this simulation are mobile and that the effects of MCC are being taken into account. Thus, ambipolar transport plays a role in the migration as does the fact that ions are being created throughout the gap by collisions. The implications of these findings, as suggested in previous work, are that of pulse shortening in relativistic magnetrons and bipolar flows in pulsed power systems.
Keywords :
Monte Carlo methods; diodes; magnetrons; plasma collision processes; plasma flow; plasma simulation; plasma transport processes; relativistic plasmas; Monte Carlo collisions; ambipolar transport; bipolar flows; crossed-field diode; electron migration; immobile ion sheet model; magnetically insulated crossed-field gap; particle-in-cell simulation; plasma collision processes; pulsed power systems; relativistic magnetrons; Anodes; Diodes; Electron mobility; Government; Insulation; Magnetrons; Monte Carlo methods; Power system protection; Predictive models; Pulse power systems;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on
Conference_Location :
San Diego, CA
ISSN :
0730-9244
Print_ISBN :
978-1-4244-2617-1
Type :
conf
DOI :
10.1109/PLASMA.2009.5227357
Filename :
5227357
Link To Document :
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